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Computer rendering of the TOPAZ Px.

TOPAZ Px – Setting the Standard in Laser Scribing for PV Modules

TOPAZ Px is our next-generation laser system designed for the perfect P1, P2 or P3 scribe on your photovoltaic module. Engineered with cutting-edge components, it delivers unmatched efficiency and accuracy – making it the preferred solution for processing PV modules.

Laser Scribing re-invented

Highest possible precision

Up to 36 individual beams are generated from the laser, with every single one precisely monitored and regulated. This solution is unmatched on the market.

Cutting-edge components

Integrated path tracking, focus tracking and individual power control of each individual beamlet in minimal installation space.

Flexible pitch with just one click

The Core4 software and the system concept allow the scribe pitch to be individually adjusted between 3 and 10 mm.

Computer-generated rendering of the TOPAZ Px.
The TOPAZ Px redefines laser scribing of photovoltaic modules
Computer-generated rendering of the TOPAZ Px.
Engineering excellence for maximum throughput and quality

How our Laser Scribing system works

The TOPAZ Px offers the possibility of integrating various laser sources. Typically, picosecond lasers with 355, 532, or 1064 nm are used.

1. The substrate is transferred from the downstream conveyor to the TOPAZ Px Scribing System.
2. The internal conveyor system transports the glass to a transfer position.
3. A gripper picks up the glass. It is then referenced in the machine coordinate system.
4. The gripper transports the glass to the processing position.
5. Processing takes place from the layer side in several passes.
6. A specially developed extraction manifold ensures direct evacuation of the ablated particulates.
7. The gripper transports the glass to the outfeed position.
8. During this transport, the optional metrology checks the process results of the scribes.
9. The substrate is transferred from the gripper to the conveyor system.

TOPAZ Px compared to other systems:

Control of every single Beam

The laser beam is split into up to 36 individual beams (in groups of six beams each). Each beam can be individually monitored and controlled.

The image shows the scribing process. The scribing results are identical by implementing individual laser power balancing. This is realized by additional sensors and precise optomechanics, which measure and actively adjust the laser power directly at workpiece level.
TOPAZ Px with individual power balancing

Path Tracking

The Path Tracking, in combination with the other closed loop controls, ensures the highest accuracy for each single scribe. The used vision system with a frame rate of up to 2 kHz and the dedicated high speed image recognition system are paramount. The final control quality depends largely on the required cycle time and the processing speed.

The image shows the scribing process. A number of measuring positions relative to the laser beams enables significantly higher accuracy of the individual scribes and a smaller distance between the individual scribes.
TOPAZ Px with individual path tracking

Focus Tracking

The laser focus Z positions can be adjusted to an accuracy of ± 50 µm and at a maximum closed loop cycle frequency of 35 Hz, ensuring consistent scribe quality at minimal response times. The final control quality depends largely on the required cycle time and the processing speed.

The image shows the scribing process. Fade outs are eliminated by providing closed-loop autofocusing of each individual laser beam. For this purpose, each individual laser beam is equipped with individual distance measurement, a fast-focusing lens and high-speed electronics.
TOPAZ Px with individual auto focus

Power Balancing

An individual Power Balancing for each beamlet enables consistent scribing results and significantly reduces the laser power overhead.

Individual Pitch adjustment

TOPAZ Px offers the unique possibility to adjust the scribe pitch individually in the HMI software. Pitches between 3 and 10 mm are possible.

Modularity

The process head is designed so that you can freely choose from one scribe engine (with six individual beams) to six scribe engines. This allows the system to be individually adapted to your needs.

Maximum flexibility in recipe management

The high flexibility of laser processing in combination with our unique HMI software enables you to create or adapt recipes with minimal effort.

Computer-generated rendering of the TOPAZ Px.
An optimized scribing process ensures minimal dead zones

TOPAZ Px: Engineering Excellence in Every Detail

Conveyor System

The flexible conveyor belt system can easily be adapted to different substrate sizes. Transport speeds of up to 1000 mm/s are possible.

Gripper

For maximum precision, the substrate is securely held and guided by grippers throughout the laser process. Depending on cycle time demands, the system can be configured with one or two grippers.

Granite Base.

Granite is used for the system frame to reach the highest level of precision. It combines excellent thermal and mechanical stability with high mass, which helps to suppress vibrations.

Process Head

The process head is designed for speeds of up to 3.5 m/s. Taking acceleration and transport times into account, a fully equipped process head can produce up to 60 m of scribes per second. All this with individual path and focus tracking, power balancing, maximum pitch flexibility, a modular design, and the option of partial configuration.

Scribe engine

At the core of the TOPAZ Px lies its scribe engine technology. Whether configured with a single unit or up to six, each engine delivers outstanding performance. Benefit from features like individual Path and Focus Tracking, Power Balancing, and adjustable pitch offsets.

Our TOPAZ Px is used worldwide to manufacture more efficient thin-film photovoltaic modules with reduced dead zones.

Exterior view of the entire Topaz Px.
Our Topaz Px is the preferred solution for processing PV modules.
Photo from the inside of the Topaz Px.
The conveyer belt system can be adapted to different substrate sizes.
Photo from inside the Topaz Px. The substrate is precisely centered.
36 laser beams guarantee precise processing.

System Specifications

CategoryParameterValueUnit
SubstrateMax. substrate size

2.350 x 1.250

mm
 

Glass thickness range

2 – 3,2

mm

System

Scribe accuracy

± 10

µm

Process

Scribe width

20 to 100

µm

 

Wavelength

355, 532, 1064

nm

Facility Requirements

CategoryParameterValueUnit

Electrical Energy (EE)

Line Voltage

400(±10%)

V

 

Frequency

50(±1%)

Hz

 

Phases

3 / N / PE

 
 

Max. Current

63

A

 

Max. pre-Fuse

100

A

 

Average Power

31

kVA

 

Apparent Power

50

kVA

 

cos phi

~0,8

 
 

Connection Type

Terminal, 25

mm²

Compressed Dry Air (CDA)

Pressure

min. 6,9

bar

  

max. 7,6

bar

 

Quality 
(DIN ISO 8573-1:2010)

Class 1

 

 

Peak Flow

200

Nl/min

 

Average Flow

150

Nl/min

 

Connection Type

Festo tube Ø 12

mm

Cooling Water

at 5 to 25°C and 3 to 5 bar

14

l/min

Temperature

Operation

+21 … +22 (±1)

°C

 

Storage

+5 … + 40

°C

Humidity

Operation

(non-condensing) 40 … 60

%rH

 

Storage

50 … 60

%rH

Noise

operation

< 74

dB(A)

Floor

Floor flatness (max. compensation)

±4

mm


Footprint / Weight

CategoryParameterValueUnit

Footprint

Main unit

5.669 x 4.289

mm²

 

incl. Service Area1

11.724 x 7.581

mm²

Height

Main unit

3.695

mm

 

Electrical cabinet

2.300

mm

Weight

Main unit

16,5

t

 

Electrical cabinet

2,5

t

Floor load

max.

625

kN/m²

 

Avg.

15,4

kN/m²

Ready to Upgrade Your Scribing Process?

Boost your production quality, reduce downtime, and lead your market with TOPAZ Px – the most advanced laser scribing system for thin-film module processing.

Contact us

FAQ – Laser scribing with the TOPAZ Px

When manufacturing PV modules, the TOPAZ Px can be used to create P1, P2, or P3 scribes. The Px is generally suitable for processing thin-film modules.

The precision and stability of the scribing process directly influences the dead zone and thus the efficiency of the PV module. One of the most important factors, however, is that the active beam adjustment can reduce the error rate and rejects, such as crossing scribes, to almost zero. In addition, the performance of the produced panels is consistently high. This significantly reduces your production costs.

Our system is compatible with CdTe, Perovskite, and CIGS thin-film modules.